Name

Hafni­um Phos­phide

Mol­e­c­u­lar Formula

HfP

Mol­e­c­u­lar Weight

209.46

CAS Num­ber (Or Wat­son Num­ber for Non-CAS Products)

12325-59-6

Appear­ance

Pow­der

Den­si­ty

9.78g/cm³

Melt­ing Point

2200℃

Boil­ing Point

Oth­er Information

Puri­ty

4N (99.99%)

Qual­i­ty Analysis

ICP-MS(99.99% all impu­ri­ties is below 100ppm), XRD(the main peak is per­fect­ly sym­met­ric )

Pack­age

It is vac­u­um packed in bot­tle pro­tect­ed by inert gas.

Appli­ca­tions

The chip dif­fu­sion source is used in the semi­con­duc­tor man­u­fac­tur­ing process to intro­duce spe­cif­ic impu­ri­ties (dopants) onto the sur­face of the chip to alter the elec­tri­cal prop­er­ties of the mate­r­i­al. The dif­fu­sion source can be in the form of sol­id, liq­uid, or gas and is com­mon­ly used in process­es such as dop­ing dif­fu­sion and ion implan­ta­tion.

Links

This prod­uct is devel­oped by our R&D com­pa­ny Wat­son Chem (https://​www​.wat​sonchem​.com/), and here is the cor­re­spond­ing link https://​www​.wat​sonchem​.com/​H​a​f​n​i​u​m​-​P​h​o​s​p​h​i​d​e​-​H​fP/

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