Structure of Sulfonium, [4-[1-(difluorosulfomethyl)-2,2,2-trifluoroethoxy]phenyl]bis[4-(1,1-dimethylethyl)phenyl]-, inner salt CAS 1465790-38-8

Iden­ti­fi­ca­tion

CAS Number

1465790-38-8

Name

Sul­fo­ni­um, [4-[1-(difluorosulfomethyl)-2,2,2-trifluoroethoxy]phenyl]bis[4-(1,1-dimethylethyl)phenyl]-, inner salt

Syn­onyms

2-(4-(bis(4-(tert-butyl)phenyl)sulfonio)phenoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonate ;PAG388

SMILES

Std­InChI

Std­InChIKey

Mol­e­c­u­lar Formula

C29H31F5O4S2

Mol­e­c­u­lar Weight

602.68

Prop­er­ties

Appear­ance

White to off-white powder

Safe­ty Data

RIDADR 

NONH for all modes of transport

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our Sul­fo­ni­um, [4-[1-(difluorosulfomethyl)-2,2,2-trifluoroethoxy]phenyl]bis[4-(1,1-dimethylethyl)phenyl]-, inner salt CAS 1465790-38-8

Iden­ti­fi­ca­tion Methods

HNMR, HPLC

Puri­ty

99% min, 99.5% min

Total Heavy Met­als Impurities

＜100ppb,＜50ppb

Shelf Life

2 years

Stor­age

Under room tem­per­a­ture away from light

Known Appli­ca­tion

I. Core Func­tion : Pho­toacid Gen­er­a­tor (PAG)
This com­pound is an aryl-tri­aryl sul­fo­ni­um inner salt and serves as a cation­ic pho­toacid gen­er­a­tor (PAG). Under UV or deep-UV (DUV) irra­di­a­tion :
It absorbs light and under­goes pho­tolyt­ic cleav­age
Pro­duces a strong acid (e.g., diflu­o­romethane­sul­fon­ic acid)
The gen­er­at­ed acid can cat­alyze chem­i­cal­ly ampli­fied reac­tions or ini­ti­ate sub­se­quent cation­ic poly­mer­iza­tion. It is a key func­tion­al addi­tive in pho­tore­sist and pho­topoly­mer cur­ing sys­tems.
II. Main Appli­ca­tion Areas

  1. Semi­con­duc­tor Pho­tore­sists (Chem­i­cal­ly Ampli­fied Pho­tore­sists, CARs)
    Applic­a­ble to :
    i-line, KrF, and ArF lith­o­g­ra­phy sys­tems
    High-res­o­lu­­tion chem­i­cal­ly ampli­fied pho­tore­sists
    Main func­tions :
    Acid gen­er­a­tion upon expo­sure
    Cat­alyzes depro­tec­tion reac­tions
    Ampli­fies expo­sure effects → improves res­o­lu­tion, sen­si­tiv­i­ty, and crit­i­cal dimen­sion / line edge rough­ness (CD/LER) con­trol
    Struc­tur­al advan­tages :
    Diflu­o­romethyl­sul­fonyl and tri­flu­o­roethoxy groups → high acid strength, low dif­fu­sion
    Aro­mat­ic and tert-butyl groups → improve ther­mal sta­bil­i­ty and sol­u­bil­i­ty
    Inner salt struc­ture → reduces migra­tion and enhances opti­cal per­for­mance in photoresists
  2. Cation­ic Pho­tocur­ing Sys­tems
    Used in UV-induced cation­ic cur­ing of epoxy resins and vinyl ether sys­tems
    UV irra­di­a­tion → acid gen­er­a­tion → ini­ti­ates cation­ic ring-open­ing poly­mer­iza­tion or crosslink­ing
    Appli­ca­tions include :
    UV-cur­able coat­ings and inks
    Elec­tron­ic encap­su­la­tion mate­ri­als
    Pho­­to-pat­tern­able insu­lat­ing lay­ers (e.g., PSPI, PI)

This prod­uct is devel­oped by our R&D com­pa­ny Wat­sonChem Advanced Chem­i­cal Mate­ri­als (https://​www​.wat​sonchem​.com/).

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