Sul­fo­ni­um, [4-(1,1-dimethylethyl)phenyl]diphenyl-, salt with 2,2-difluoro-2-sulfo-1-(trifluoromethyl)ethyl 4-oxotricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1162727-11-8

• Iden­ti­fi­ca­tion
• Prop­er­ties
• Safe­ty Data
• Spec­i­fi­ca­tions & Oth­er Information
• Links
• Quick Inquiry

Iden­ti­fi­ca­tion

CAS Number

1162727-11-8

Name

Sul­fo­ni­um, [4-(1,1-dimethylethyl)phenyl]diphenyl-, salt with 2,2-difluoro-2-sulfo-1-(trifluoromethyl)ethyl 4-oxotricyclo[3.3.1.13,7]decane-1-carboxylate (1:1)

Syn­onyms

(4-tert-butylphenyl)di(phenyl)sulfanium 1,1,3,3,3-pentafluoro-2-[(4-oxotricyclo[3.3.1.1~3,7~]decane-1-carbonyl)oxy]propane-1-sulfonate
[IUPAC name – gen­er­at­ed by ACD/​Name]
(4-tert-Butylphenyl)di(phenyl)sulfanium-1,1,3,3,3-pentafluor-2-[(4-oxotricyclo[3.3.1.1~3,7~]decan-1-carbonyl)oxy]propan-1-sulfonat
[Ger­man]
[IUPAC name – gen­er­at­ed by ACD/​Name]
1,1,3,3,3-pentafluoro-2-[(4-oxotricyclo[3.3.1.1~3,7~]décane-1-carbonyl)oxy]propane-1-sulfonate de (4-tert-butylphényl)di(phényl)sulfanium
[French]
[IUPAC name – gen­er­at­ed by ACD/​Name]
Unver­i­fied
(4-(tert-butyl)phenyl)diphenylsulfonium 1,1,3,3,3-pentafluoro-2-((4-oxoadamantane-1-carbonyl)oxy)propane-1-sulfonate
(4-tert-butylphenyl)-diphenyl-sulfonium 1,1,3,3,3-pentafluoro-2-(4-oxoadamantane-1-carbonyl)oxy-propane-1-sulfonate
(4-tert-butylphenyl)-diphenyl-sulfonium;1,1,3,3,3-pentafluoro-2-(4-oxoadamantane-1-carbonyl)oxy-propane-1-sulfonate

SMILES

CC(C)(C)c1ccc(S+c2ccccc2)cc1.O=C1C2CC3CC1CC(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)[O-])(C3)C2

Std­InChI

InChI=1S/C22H23S.C14H15F5O6S/c1-22(2,3)18-14-16-21(17-15-18)23(19-10-6-4-7-11-19)20-12-8-5-9-13-20;15-13(16,17)10(14(18,19)26(22,23)24)25-11(21)12-3-6-1-7(4-12)9(20)8(2-6)5-12/h4-17H,1-3H3;6-8,10H,1-5H2,(H,22,23,24)/q+1;/p-1

Std­InChIKey

SLJCD­CHXGUTEEZ-UHF­F­­FAOYSA-M

Mol­e­c­u­lar Formula

C36H37F5O6S2

Mol­e­c­u­lar Weight

724.796

Prop­er­ties

Appear­ance

White to off-white powder

Safe­ty Data

Sym­bol

GHS07

Sig­nal Word

Warn­ing

Haz­ard statements

Pre­cau­tion­ary Statements

RIDADR 

NONH for all modes of transport

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our Sul­fo­ni­um, [4-(1,1-dimethylethyl)phenyl]diphenyl-, salt with 2,2-difluoro-2-sulfo-1-(trifluoromethyl)ethyl 4-oxotricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1162727-11-8

Iden­ti­fi­ca­tion Methods

HNMR, HPLC

Puri­ty

99% min, 99.5% min

Total met­al impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Stor­age

Under room tem­per­a­ture away from light

Known Appli­ca­tion

This prod­uct is pri­mar­i­ly used as a pho­toacid gen­er­a­tor (PAG) in chem­i­cal­ly ampli­fied pho­tore­sist sys­tems for advanced semi­con­duc­tor lith­o­g­ra­phy. Upon UV or deep ultra­vi­o­let (DUV) expo­sure, it gen­er­ates strong acids that cat­alyze depro­tec­tion reac­tions in pho­tore­sists, enabling high-res­o­lu­­tion pat­tern for­ma­tion and improved lith­o­graph­ic performance.

Typ­i­cal appli­ca­tions include :
Semi­con­duc­tor pho­tore­sist for­mu­la­tions
Inte­grat­ed cir­cuit (IC) man­u­fac­tur­ing
DUV lith­o­g­ra­phy process­es
Micro­elec­tron­ic and nanofab­ri­ca­tion tech­nolo­gies
Chem­i­cal­ly ampli­fied resist (CAR) sys­tems
Advanced pack­ag­ing and elec­tron­ic materials

As a sul­fo­ni­um salt-based PAG, it offers high acid gen­er­a­tion effi­cien­cy, good ther­mal sta­bil­i­ty, and suit­abil­i­ty for high-res­o­lu­­tion lith­o­graph­ic patterning.

Links

This prod­uct is devel­oped by our R&D com­pa­ny Wat­sonChem Advanced Chem­i­cal Mate­ri­als (https://​www​.wat​sonchem​.com/).

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