Identification
CAS Number
1118-71-4
Name
2,2,6,6-Tetramethyl-3,5-heptanedione
Synonyms
1118-71-4 [RN]
2,2,6,6-Tetramethyl-3,5-heptandion [German] [ACD/IUPAC Name]
2,2,6,6-Tetramethyl-3,5-heptanedione [ACD/IUPAC Name]
2,2,6,6-Tétraméthyl-3,5-heptanedione [French] [ACD/IUPAC Name]
2,2,6,6-Tetramethyl-3,5-heptanedione dipivaloylmethane
2,2,6,6-Tetramethylheptane-3,5-dione
214-268-3 [EINECS]
3,5-Heptanedione, 2,2,6,6-tetramethyl- [ACD/Index Name]
Dipivaloylmethane
(CH3)3CCOCH2COC(CH3)3
[1118-71-4]
2,2,6,6-Tetramethyl heptanedione
2,2,6,6-Tetramethyl-3,5-heptanedione (Dipivaloylmethane)
2,2,6,6-tetramethyl-3,5-heptanedione 98%
2,2,6,6-tetramethyl-3,5-heptanedione, 98%
2,2,6,6-tetramethyl-3,5-heptanedione, 99+%
2,2,6,6-tetramethyl-3,5-heptanedione;
2,2,6,6-tetramethyl-3,5-heptanedione???
2,2,6,6-tetramethylheptan-3,5-dione
2,2,6,6-tetramethyl-heptane-3,5-dione
2,2,6,6-tetramethylheptane-3,5-dione, 98% tmhd
214-268-3MFCD00008848
214-275-1 [EINECS]
3,5-Dioxo-2,2,6,6-tetramethylheptane
3,5-Heptanedione,2,2,6,6-tetramethyl-
95 %
98% TMHD
BR-73090
dipivaloyl methane
Dipivaloylmethane, 3,5-Dioxo-2,2,6,6-tetramethylheptane
Dipivaloylmethane ; 3,5-Dioxo-2,2,6,6-tetramethylheptane
Dpm-H
EINECS 214-268-3
http:////www.amadischem.com/proen/524603/
http://en.atomaxchem.com/1118-71-4.html
l14527
QA-4721
ST50825222
STR03983
T5654934
YRAJNWYBUCUFBD-UHFFFAOYSA-N
SMILES
CC(C)(C)C(=O)CC(=O)C(C)(C)C
StdInChI
InChI=1S/C11H20O2/c1-10(2,3)8(12)7-9(13)11(4,5)6/h7H2,1-6H3
StdInChIKey
YRAJNWYBUCUFBD-UHFFFAOYSA-N
Molecular Formula
(CH3)3CCOCH2COC(CH3)3
Molecular Weight
184.28
EINECS
214-268-3
Beilstein Registry Number
1447269
MDL Number
MFCD00008848
Properties
Appearance
Light yellow liquid
Safety Data
Personal Protective Equipment
dust mask type N95 (US),Eyeshields,Gloves
WGK Germany
1
Specifications and Other Information of Our 2,2,6,6-Tetramethyl-3,5-heptanedione CAS 1118-71-4
Identification Methods
HNMR, GC
Purity
98% min
Shelf Life
2 years
Storage
Store at 2-8℃ for long time, sealed and away from light.
Known Application
It can be used as a catalyst for a variety of organic synthesis reactions, and can also be widely used as a MOCVD precursor to further prepare semiconductor materials such as precious metal films.
General View of Documents
Links
This product is developed by our R&D company Warshel Chemical Ltd (https://www.warshel.com/).
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