Identification
CAS Number
352535-01-4
Name
TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM
Synonyms
352535-01-4 [RN]
Ethanamine, N-methyl-, hafnium salt (4:1) [ACD/Index Name]
Hafnium tetrakis[ethyl(methyl)azanide] [ACD/IUPAC Name]
Hafniumtetrakis[ethyl(methyl)azanid] [German] [ACD/IUPAC Name]
MFCD03427130 [MDL number]
TEMAH
Tetrakis(ethylmethylamido)hafnium(IV)
Tetrakis(ethylmethylamino)hafnium(IV)
Tétrakis[éthyl(méthyl)azanide] d’hafnium [French] [ACD/IUPAC Name]
ETHANAMINE, N-METHYL-, HAFNIUM(4+) SALT (4:1)
ETHYL(METHYL){TRIS[ETHYL(METHYL)AMINO]HAFNIO}AMINE
HAFNIUM TETRAKIS(ETHYLMETHYLAMIDE)
temah : hf[n(ch3)(ch2ch3)]4
Tetrakis(ethylmethylamino)hafnium
SMILES
CCN(C)[Hf](N(C)CC)(N(C)CC)N(C)CC
StdInChI
InChI=1S/4C3H8N.Hf/c41-3-4-2;/h43H2,1-2H3;/q4*-1;+4
StdInChIKey
NPEOKFBCHNGLJD-UHFFFAOYSA-N
Molecular Formula
C12H32HfN4
Molecular Weight
410.899
MDL Number
MFCD03427130
Properties
Appearance
Colorless liquid
Structure
structure of TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM CAS 352535-01-4
Safety Data
Symbol
GHS02,GHS05,GHS07Signal Word
Warning
Hazard statements
H225 – H260 – H302 – H314 – H335Precautionary Statements
P210 – P231 + P232 – P280 – P301 + P312 – P303 + P361 + P353 – P305 + P351 + P338WGK Germany
3
MSDS Download
Specifications and Other Information of Our
Identification Methods
MS
Purity
99.99% min
Chloride ion
≤10ppm
Shelf Life
1 year
Known Application
TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM CAS 352535-01-4 is a common metal-organic precursor used in thin film deposition in the semiconductor industry. It is employed for the deposition of high-quality HfO2 (hafnium oxide) thin films, which are crucial in manufacturing high-dielectric constant materials and Metal-Insulator-Semiconductor Field-Effect Transistors (MISFETs).
General View of Documents
Links
This product is developed by our R&D company Warshel Chemical Ltd (https://www.warshel.com/).
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