Structure of Trifluoroamine CAS 7783 54 2 - Trifluoroamine CAS 7783-54-2

Iden­ti­fi­ca­tion

CAS Number

7783-54-2

Name

Tri­flu­o­roamine

Syn­onyms

232-007-1 [EINECS]
7783-54-2 [RN]
NITRO­GEN TRI­FLU­O­RIDE
Tri­flu­o­ramin [Ger­man] [ACD/IUPAC Name]
Tri­flu­o­roamine [ACD/IUPAC Name]
Tri­flu­o­roamine [French] [ACD/IUPAC Name]
[NF3]
186958-04-3 [RN]
EINECS 232-007-1
https://​www​.ebi​.ac​.uk/​c​h​e​b​i​/​s​e​a​r​c​h​I​d​.​d​o​?​c​h​e​b​i​I​d​=​C​H​E​B​I​:​3​0​231
N,N,N-Trifluoroamine
NF3
nitro­gen flu­o­ride
Nitro­gen flu­o­ride (NF3)
Nitro­gen tri­flu­o­ride 99%
Nitro­gen tri­flu­o­ride, com­pressed [UN2451] [Non­flam­ma­ble gas]
nitro­gen tri­flu­o­ride ; tri­flu­o­ri­donitro­gen ; tri­flu­o­roazane
nitro­gen­tri­flu­o­ride
Per­flu­o­roam­mo­nia
TRI­FLU­O­RAMINE
Tri­flu­o­ram­mo­nia
tri­flu­o­ri­donitro­gen
tri­flu­o­roam­mo­nia
tri­flu­o­roazane
UN 2451
三氟化氮 [Chi­nese]

SMILES

N(F)(F)F

Std­InChI

InChI=1S/F3N/c1-4(2)3

Std­InChIKey

GVGCUCJ­­TU­­SOZKP-UHF­F­­FAOYSA-N

Mol­e­c­u­lar Formula

F3N

Mol­e­c­u­lar Weight

71.002

EINECS

232-007-1

Prop­er­ties

Appear­ance

Col­or­less liquid

Melt­ing Point

-206.8℃

Boil­ing Point

-129.0℃

Safe­ty Data

WGK Germany

3

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our Tri­flu­o­roamine CAS 7783-54-2

Iden­ti­fi­ca­tion Methods

GC

ItemsSpec­i­fi­ca­tion NO.1 Spec­i­fi­ca­tion NO.2 Spec­i­fi­ca­tion NO.3 Spec­i­fi­ca­tion NO.4 Spec­i­fi­ca­tion NO.5
NF3≥99.5%≥99.9% ≥99.98% ≥99.99% ≥99.996%
CF4≤1500ppm≤500ppm ≤100ppm ≤50ppm ≤20ppm
N2≤700ppm ≤50ppm ≤10ppm ≤10ppm ≤5ppm
O2+Ar ≤700ppm ≤50ppm ≤10ppm ≤5ppm≤3ppm
CO≤50ppm ≤10ppm ≤10ppm ≤5ppm ≤1ppm
CO2≤25ppm ≤10ppm ≤10ppm ≤5ppm ≤0.5ppm
N2O≤50ppm ≤10ppm ≤10ppm ≤5ppm ≤1ppm
SF6 ≤50ppm ≤50ppm ≤10ppm ≤5ppm ≤2ppm
Hydrolyz­able fluoride≤1ppm ≤1ppm ≤1ppm ≤1ppm ≤1ppm
H2O≤1ppm ≤1ppm ≤1ppm ≤1ppm ≤1ppm

Shelf Life

2 years

Stor­age

Under room tem­per­a­ture away from light

Pack­age

Nitro­gen tri­flu­o­ride is filled in steel seam­less gas cylin­ders, the cylin­der vol­ume is 8L, 40L, 43.3L, 47L respec­tive­ly ; the cylin­der pres­sure is 9.0-13.0MPa. The spe­cif­ic pack­ag­ing spec­i­fi­ca­tions can be cus­tomized and changed accord­ing to user needs.

Known Appli­ca­tion

Nitro­gen tri­flu­o­ride can be used as a flu­o­rine source for high-ener­­gy chem­i­cal laser gas, and can also be used as an etchant for semi­con­duc­tor mate­ri­als such as poly­sil­i­con, sil­i­con nitride, and tung­sten sili­cide. It can also be used as a clean­ing agent for chem­i­cal vapor depo­si­tion cham­bers and liq­uid crys­tal dis­play pan­els in the pro­duc­tion of semi­con­duc­tor chips. Using nitro­gen tri­flu­o­ride as a clean­ing agent for CVD tanks can reduce pol­lu­tant emis­sions by about 90% com­pared with per­flu­o­ro­car­bons, and It can sig­nif­i­cant­ly increase the clean­ing speed and improve the clean­ing ability.

This prod­uct is devel­oped by our R&D com­pa­ny Wat­son­noke Sci­en­tif­ic Ltd (http://​www​.wat​son​noke​.com/).

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