Identification
CAS Number
7783-54-2
Name
Trifluoroamine
Synonyms
232-007-1 [EINECS]
7783-54-2 [RN]
NITROGEN TRIFLUORIDE
Trifluoramin [German] [ACD/IUPAC Name]
Trifluoroamine [ACD/IUPAC Name]
Trifluoroamine [French] [ACD/IUPAC Name]
[NF3]
186958-04-3 [RN]
EINECS 232-007-1
https://www.ebi.ac.uk/chebi/searchId.do?chebiId=CHEBI:30231
N,N,N-Trifluoroamine
NF3
nitrogen fluoride
Nitrogen fluoride (NF3)
Nitrogen trifluoride 99%
Nitrogen trifluoride, compressed [UN2451] [Nonflammable gas]
nitrogen trifluoride ; trifluoridonitrogen ; trifluoroazane
nitrogentrifluoride
Perfluoroammonia
TRIFLUORAMINE
Trifluorammonia
trifluoridonitrogen
trifluoroammonia
trifluoroazane
UN 2451
三氟化氮 [Chinese]
SMILES
N(F)(F)F
StdInChI
InChI=1S/F3N/c1-4(2)3
StdInChIKey
GVGCUCJTUSOZKP-UHFFFAOYSA-N
Molecular Formula
F3N
Molecular Weight
71.002
EINECS
232-007-1
Properties
Appearance
Colorless liquid
Melting Point
-206.8℃
Boiling Point
-129.0℃
Safety Data
WGK Germany
3
Specifications and Other Information of Our Trifluoroamine CAS 7783-54-2
Identification Methods
GC
Items | Specification NO.1 | Specification NO.2 | Specification NO.3 | Specification NO.4 | Specification NO.5 |
NF3 | ≥99.5% | ≥99.9% | ≥99.98% | ≥99.99% | ≥99.996% |
CF4 | ≤1500ppm | ≤500ppm | ≤100ppm | ≤50ppm | ≤20ppm |
N2 | ≤700ppm | ≤50ppm | ≤10ppm | ≤10ppm | ≤5ppm |
O2+Ar | ≤700ppm | ≤50ppm | ≤10ppm | ≤5ppm | ≤3ppm |
CO | ≤50ppm | ≤10ppm | ≤10ppm | ≤5ppm | ≤1ppm |
CO2 | ≤25ppm | ≤10ppm | ≤10ppm | ≤5ppm | ≤0.5ppm |
N2O | ≤50ppm | ≤10ppm | ≤10ppm | ≤5ppm | ≤1ppm |
SF6 | ≤50ppm | ≤50ppm | ≤10ppm | ≤5ppm | ≤2ppm |
Hydrolyzable fluoride | ≤1ppm | ≤1ppm | ≤1ppm | ≤1ppm | ≤1ppm |
H2O | ≤1ppm | ≤1ppm | ≤1ppm | ≤1ppm | ≤1ppm |
Shelf Life
2 years
Storage
Under room temperature away from light
Package
Nitrogen trifluoride is filled in steel seamless gas cylinders, the cylinder volume is 8L, 40L, 43.3L, 47L respectively ; the cylinder pressure is 9.0-13.0MPa. The specific packaging specifications can be customized and changed according to user needs.
Known Application
Nitrogen trifluoride can be used as a fluorine source for high-energy chemical laser gas, and can also be used as an etchant for semiconductor materials such as polysilicon, silicon nitride, and tungsten silicide. It can also be used as a cleaning agent for chemical vapor deposition chambers and liquid crystal display panels in the production of semiconductor chips. Using nitrogen trifluoride as a cleaning agent for CVD tanks can reduce pollutant emissions by about 90% compared with perfluorocarbons, and It can significantly increase the cleaning speed and improve the cleaning ability.
Links
This product is developed by our R&D company Watsonnoke Scientific Ltd (http://www.watsonnoke.com/).
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