Structure of Triphenylsulfonium, 2-hydroxybenzoate (11) CAS 345580-99-6

Iden­ti­fi­ca­tion

CAS Number

345580-99-6

Name

Triph­enyl­sul­fo­ni­um, 2-hydrox­­y­ben­­zoate (1:1)

Syn­onyms

Triph­enyl­sul­fo­ni­um, 2-hydrox­­y­ben­­zoate ;
Triph­enyl­sul­fo­ni­um salicylate

SMILES

C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C1=CC=C(C(=C1)C(=O)O)[O-]

Std­InChI

InChI=1S/C18H15S.C7H6O3/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;8-6-4-2-1-3-5(6)7(9)10/h1-15H;1-4,8H,(H,9,10)/q+1;/p-1

Std­InChIKey

KKLIEUW­P­BXKN­FS-UHF­F­­FAOYSA-M

Mol­e­c­u­lar Formula

C25H20O3S

Mol­e­c­u­lar Weight

400.5

Prop­er­ties

Appear­ance

White to off-white powder

Safe­ty Data

RIDADR 

NONH for all modes of transport

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our Triph­enyl­sul­fo­ni­um, 2-hydrox­­y­ben­­zoate (1:1) CAS 345580-99-6

Iden­ti­fi­ca­tion Methods

HNMR, HPLC

Puri­ty

99% min, 99.5% min

Total Heavy Met­als Impurities

＜100ppb,＜50ppb

Shelf Life

2 years

Stor­age

Under room tem­per­a­ture away from light

Known Appli­ca­tion

I. Core Func­tion : Pho­toacid Gen­er­a­tor (PAG) This com­pound is a triph­enyl­sul­fo­ni­um salt-based pho­toacid gen­er­a­tor (PAG). Under UV or deep-UV (DUV) irra­di­a­tion : It absorbs light and under­goes pho­tolyt­ic cleav­age Gen­er­ates a strong acid The gen­er­at­ed acid can cat­alyze chem­i­cal­ly ampli­fied reac­tions or ini­ti­ate sub­se­quent cation­ic poly­mer­iza­tion. It is a key func­tion­al addi­tive in pho­tore­sist and cation­ic pho­topoly­mer cur­ing sys­tems. II. Main Appli­ca­tion Areas 1. Semi­con­duc­tor Pho­tore­sists (Chem­i­cal­ly Ampli­fied Pho­tore­sists, CARs) Applic­a­ble to : i-line, KrF, and ArF lith­o­g­ra­phy sys­tems High-res­o­lu­­tion chem­i­cal­ly ampli­fied pho­tore­sists Main func­tions : Acid gen­er­a­tion upon expo­sure Cat­alyzes depro­tec­tion reac­tions Ampli­fies expo­sure effects → improves res­o­lu­tion, sen­si­tiv­i­ty, and crit­i­cal dimen­sion / line edge rough­ness (CD/LER) con­trol Advan­tages of the ortho-hydrox­­y­ben­­zoate struc­ture : Pro­vides good pho­to­sen­si­tiv­i­ty Reduces acid dif­fu­sion, improv­ing res­o­lu­tion Works syn­er­gis­ti­cal­ly with the triph­enyl­sul­fo­ni­um cation → good ther­mal sta­bil­i­ty and sta­ble pho­tore­sist per­for­mance 2. Cation­ic Pho­tocur­ing Sys­tems Used in UV-induced cation­ic cur­ing of epoxy resins and vinyl ether sys­tems UV irra­di­a­tion → acid gen­er­a­tion → ini­ti­ates cation­ic ring-open­ing poly­mer­iza­tion or crosslink­ing Appli­ca­tions include : UV-cur­able coat­ings and inks Elec­tron­ic encap­su­la­tion mate­ri­als Pho­­to-pat­tern­able insu­lat­ing lay­ers (e.g., PSPI, PI)

This prod­uct is devel­oped by our R&D com­pa­ny Wat­sonChem Advanced Chem­i­cal Mate­ri­als (https://​www​.wat​sonchem​.com/).

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