TBPDPS-PFBS CAS 258872-05-8

• Iden­ti­fi­ca­tion
• Prop­er­ties
• Safe­ty Data
• Spec­i­fi­ca­tions & Oth­er Information
• Links
• Quick Inquiry

Iden­ti­fi­ca­tion

CAS Number

258872-05-8

Name

TBPDPS-PFBS

Syn­onyms

Di-p-tolyl iodo­nium salt : per­flu­o­robutyl sulphonate (1:1)
Diphenyl 4-tert­butylphenyl­­sul­­fo­ni­um non­a­flu­o­robu­tane­sul­fonate
(4-tert-butylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
(4-(tert-Butyl)phenyl)diphenylsulfonium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
Diphenyl 4-tert-butylphenyl­­sul­­fo­ni­um non­a­flu­o­robu­tane­sul­fonate
Sul­fo­ni­um, [4-(1,1-Dimethylethyl)Phenyl]Diphenyl-,1,1,2,2,3,3,4,4,4-Nonafluoro-1-Butanesulfonate (1:1)

SMILES

CC(C)(C)C1=CC=C(C=C1)S+C3=CC=CC=C3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F

Std­InChI

InChI=1S/C22H23S.C4HF9O3S/c1-22(2,3)18-14-16-21(17-15-18)23(19-10-6-4-7-11-19)20-12-8-5-9-13-20;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h4-17H,1-3H3;(H,14,15,16)/q+1;/p-1

Std­InChIKey

GXZZZ­WUTJCPY­HC-UHF­F­­FAOYSA-M

Mol­e­c­u­lar Formula

C₂₆H₂₃F₉O₃S₂

Mol­e­c­u­lar Weight

618.6

Prop­er­ties

Appear­ance

White to off-white powder

Safe­ty Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our TBPDPS-PFBS CAS 258872-05-8

Iden­ti­fi­ca­tion Methods

HNMR, HPLC

Puri­ty

99%min, 99.5% min

Total met­al impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Stor­age

Under room tem­per­a­ture away from light

Known Appli­ca­tion

1. Semi­con­duc­tor Pho­tolith­o­g­ra­phy
   Its pri­ma­ry use is as a pho­toacid gen­er­a­tor in chem­i­cal­ly ampli­fied pho­tore­sists used for semi­con­duc­tor fab­ri­ca­tion. Upon expo­sure to UV, DUV, elec­tron-beam, or EUV radi­a­tion, it gen­er­ates a strong acid that dri­ves resist chem­istry and pat­tern formation.
2. Advanced Pho­tore­sist For­mu­la­tions
   Used in :
   Deep UV (DUV) pho­tore­sists
   EUV pho­tore­sists
   Elec­tron-beam resists
   Micro­elec­tron­ic pat­tern­ing mate­ri­als
   The non­a­flu­o­robu­tane­sul­fonate coun­te­ri­on pro­vides strong acid­i­ty while help­ing con­trol acid dif­fu­sion, an impor­tant fac­tor for high-res­o­lu­­tion lithography.
3. MEMS and Micro­fab­ri­ca­tion
   Applied in :
   MEMS device man­u­fac­tur­ing
   Microflu­idic device fab­ri­ca­tion
   High-res­o­lu­­tion micro-pat­tern­ing
   Spe­cial­ty elec­tron­ic mate­ri­als research
4. UV-Cur­able Mate­ri­als Research
   Sul­fo­ni­um PAGs such as this com­pound are inves­ti­gat­ed for :
   UV-cur­able coat­ings
   Opti­cal mate­ri­als
   Func­tion­al poly­mers
   Crosslink­ing and poly­mer mod­i­fi­ca­tion chemistry

Links

This prod­uct is devel­oped by our R&D com­pa­ny Wat­sonChem Advanced Chem­i­cal Mate­ri­als (https://​www​.wat​sonchem​.com/).

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