Structure of Triphenylsulfonium 3,3,3-trifluoro-2-hy-droxy-2-trifluoromethylpropionate CAS 365971-74-0

Iden­ti­fi­ca­tion

CAS Number

365971-74-0

Name

Triph­enyl­sul­fo­ni­um 3,3,3-trifluoro-2-hy-droxy-2-trifluoromethylpropionate

Syn­onyms

3,3,3-trifluoro-2-hydroxy-2-(trifluorométhyl)propanoate de triphényl­sul­fa­ni­um
[French]
[IUPAC name – gen­er­at­ed by ACD/​Name]
triph­enyl­sul­fa­ni­um 3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate
[IUPAC name – gen­er­at­ed by ACD/​Name]
Triphenylsulfanium-3,3,3-trifluor-2-hydroxy-2-(trifluormethyl)propanoat
[Ger­man]
[IUPAC name – gen­er­at­ed by ACD/​Name]
Unver­i­fied
3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate triph­enyl­sul­fo­ni­um
3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate;triphenylsulfonium
365971-74-0
[RN]
Triph­enyl­sul­fo­ni­um 3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate

SMILES

O=C([O-])C(O)(C(F)(F)F)C(F)(F)F.c1ccc(S+c2ccccc2)cc1

Std­InChI

O=C([O-])C(O)(C(F)(F)F)C(F)(F)F.c1ccc(S+c2ccccc2)cc1

Std­InChIKey

GHOSQ­­FO­­BODX­TJJ-UHF­F­­FAOYSA-M

Mol­e­c­u­lar Formula

C22H16F6O3S

Mol­e­c­u­lar Weight

474.415

Prop­er­ties

Appear­ance

White to off-white powder

Safe­ty Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our Triph­enyl­sul­fo­ni­um 3,3,3-trifluoro-2-hy-droxy-2-trifluoromethylpropionate CAS 365971-74-0

Iden­ti­fi­ca­tion Methods

HNMR, HPLC

Puri­ty

99%min, 99.5% min

Total met­al impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Stor­age

Under room tem­per­a­ture away from light

Known Appli­ca­tion

This prod­uct is pri­mar­i­ly used as a pho­toacid gen­er­a­tor (PAG) in chem­i­cal­ly ampli­fied pho­tore­sist sys­tems for advanced semi­con­duc­tor lith­o­g­ra­phy. Upon expo­sure to UV or deep ultra­vi­o­let (DUV) light, it gen­er­ates strong acids that ini­ti­ate cat­alyt­ic depro­tec­tion reac­tions in pho­tore­sist mate­ri­als, enabling high-res­o­lu­­tion pat­tern formation.

Typ­i­cal appli­ca­tions include :
Semi­con­duc­tor pho­tore­sist for­mu­la­tions
Inte­grat­ed cir­cuit (IC) man­u­fac­tur­ing
Advanced lith­o­g­ra­phy process­es (DUV / ArF)
Micro­elec­tron­ic and nanofab­ri­ca­tion tech­nolo­gies
Chem­i­cal­ly ampli­fied resist (CAR) sys­tems
Advanced pack­ag­ing appli­ca­tions
Elec­tron­ic and opto­elec­tron­ic materials

This type of sul­fo­ni­um salt PAG is wide­ly used due to its high acid gen­er­a­tion effi­cien­cy, good ther­mal sta­bil­i­ty, and suit­abil­i­ty for advanced-node lith­o­g­ra­phy process­es requir­ing high res­o­lu­tion and low line-edge roughness.

This prod­uct is devel­oped by our R&D com­pa­ny Wat­sonChem Advanced Chem­i­cal Mate­ri­als (https://​www​.wat​sonchem​.com/).

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