Triph­enyl­sul­fo­ni­um salt with 1-(tricyclo[3.3.1.13,7]dec-1-ylmethyl) 2,2-difluoro-2-sulfoacetate (1:1) CAS 1022939-88-3

• Iden­ti­fi­ca­tion
• Prop­er­ties
• Safe­ty Data
• Spec­i­fi­ca­tions & Oth­er Information
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Iden­ti­fi­ca­tion

CAS Number

1022939-88-3

Name

Triph­enyl­sul­fo­ni­um salt with 1-(tricyclo[3.3.1.13,7]dec-1-ylmethyl) 2,2-difluoro-2-sulfoacetate (1:1)

Syn­onyms

triph­enyl­sul­fo­ni­um ((1-adamantyl)methoxycarbonyl)difluoromethanesulfonate
triph­enyl­sul­fo­ni­um (adamantane-1-ylmethyl)oxycarbonyldifluoromethanesulfonate

SMILES

C1C2CC3CC1CC(C2)(C3)COC(=O)C(F)(F)S(=O)(=O)[O-].C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3

Std­InChI

InChI=1S/C18H15S.C13H18F2O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;14-13(15,21(17,18)19)11(16)20-7-12-4-8-1-9(5-12)3-10(2-8)6-12/h1-15H;8-10H,1-7H2,(H,17,18,19)/q+1;/p-1

Std­InChIKey

OPUSNKQMM­L­RYMS-UHF­F­­FAOYSA-M

Mol­e­c­u­lar Formula

C31H32F2O5S2

Mol­e­c­u­lar Weight

586.7

Prop­er­ties

Appear­ance

White to off-white powder

Safe­ty Data

RIDADR 

NONH for all modes of transport

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our Triph­enyl­sul­fo­ni­um salt with 1-(tricyclo[3.3.1.13,7]dec-1-ylmethyl) 2,2-difluoro-2-sulfoacetate (1:1) CAS 1022939-88-3

Iden­ti­fi­ca­tion Methods

HNMR, HPLC

Puri­ty

99% min, 99.5% min

Total Heavy Met­als Impurities

＜100ppb,＜50ppb

Shelf Life

2 years

Stor­age

Under room tem­per­a­ture away from light

Known Appli­ca­tion

I. Core Func­tion : Pho­toacid Gen­er­a­tor (PAG)
This com­pound is a triph­enyl­sul­fo­ni­um salt-based pho­toacid gen­er­a­tor (PAG). Under UV or deep-UV (DUV) irra­di­a­tion :
It absorbs light and under­goes pho­tolyt­ic cleav­age
Pro­duces a strong acid (diflu­o­romethane­sul­fon­ic acid)
The gen­er­at­ed acid can cat­alyze chem­i­cal­ly ampli­fied reac­tions or ini­ti­ate sub­se­quent cation­ic poly­mer­iza­tion. It is a key func­tion­al addi­tive in pho­tore­sist and cation­ic pho­topoly­mer cur­ing sys­tems.
II. Main Appli­ca­tion Areas
1.Semiconductor Pho­tore­sists (Chem­i­cal­ly Ampli­fied Pho­tore­sists, CARs)
Applic­a­ble to :
i-line, KrF, and ArF lith­o­g­ra­phy sys­tems
High-res­o­lu­­tion chem­i­cal­ly ampli­fied pho­tore­sists
Main func­tions :
Acid gen­er­a­tion upon expo­sure
Cat­alyzes depro­tec­tion reac­tions
Ampli­fies expo­sure effects → improves res­o­lu­tion, sen­si­tiv­i­ty, and crit­i­cal dimen­sion / line edge rough­ness (CD/LER) con­trol
Advan­tages of the adamantyl struc­ture :
Pro­vides high ther­mal sta­bil­i­ty
Reduces acid dif­fu­sion → improves res­o­lu­tion and line edge rough­ness
Enhances opti­cal per­for­mance and for­mu­la­tion sta­bil­i­ty of photoresists

2. Cation­ic Pho­tocur­ing Sys­tems
   Used in UV-induced cation­ic cur­ing of epoxy resins and vinyl ether mate­ri­als
   UV irra­di­a­tion → acid gen­er­a­tion → ini­ti­ates cation­ic ring-open­ing poly­mer­iza­tion or crosslink­ing
   Appli­ca­tions include :
   UV-cur­able coat­ings and inks
   Elec­tron­ic encap­su­la­tion mate­ri­als
   Pho­­to-pat­tern­able insu­lat­ing lay­ers (e.g., PSPI, PI)

Links

This prod­uct is devel­oped by our R&D com­pa­ny Wat­sonChem Advanced Chem­i­cal Mate­ri­als (https://​www​.wat​sonchem​.com/).

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