Sul­fo­ni­um, triph­enyl-, salt with 3,3,4,4-tetrafluoro-4-sulfobutyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1001347-91-6

• Iden­ti­fi­ca­tion
• Prop­er­ties
• Safe­ty Data
• Spec­i­fi­ca­tions & Oth­er Information
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Iden­ti­fi­ca­tion

CAS Number

1001347-91-6

Name

Sul­fo­ni­um, triph­enyl-, salt with 3,3,4,4-tetrafluoro-4-sulfobutyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1)

Syn­onyms

1,1,2,2-tétrafluoro-4-[(tricyclo[3.3.1.1~3,7~]décane-1-carbonyl)oxy]butane-1-sulfonate de triphénylsulfanium[French]
[IUPAC name – gen­er­at­ed by ACD/​Name]
triph­enyl­sul­fa­ni­um 1,1,2,2-tetrafluoro-4-[(tricyclo[3.3.1.1~3,7~]decane-1-carbonyl)oxy]butane-1-sulfonate
[IUPAC name – gen­er­at­ed by ACD/​Name]
Triphenylsulfanium-1,1,2,2-tetrafluor-4-[(tricyclo[3.3.1.1~3,7~]decan-1-carbonyl)oxy]butan-1-sulfonat
[Ger­man]
[IUPAC name – gen­er­at­ed by ACD/​Name]
4-(adamantane-1-carbonyloxy)-1,1,2,2-tetrafluoro-butane-1-sulfonate;triphenylsulfonium
Triph­enyl­sul­fo­ni­um 4-((adamantane-1-carbonyl)oxy)-1,1,2,2-tetrafluorobutane-1-sulfonate

SMILES

O=C(OCCC(F)(F)C(F)(F)S(=O)(=O)[O-])C12CC3CC(CC(C3)C1)C2.c1ccc(S+c2ccccc2)cc1

Std­InChI

InChI=1S/C18H15S.C15H20F4O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;16-14(17,15(18,19)25(21,22)23)1-2-24-12(20)13-6-9-3-10(7-13)5-11(4-9)8-13/h1-15H;9-11H,1-8H2,(H,21,22,23)/q+1;/p-1

Std­InChIKey

InChI=1S/C18H15S.C15H20F4O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;16-14(17,15(18,19)25(21,22)23)1-2-24-12(20)13-6-9-3-10(7-13)5-11(4-9)8-13/h1-15H;9-11H,1-8H2,(H,21,22,23)/q+1;/p-1

Mol­e­c­u­lar Formula

C33H34F4O5S2

Mol­e­c­u­lar Weight

650.742

Prop­er­ties

Appear­ance

White to off-white powder

Safe­ty Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Spec­i­fi­ca­tions and Oth­er Infor­ma­tion of Our Sul­fo­ni­um, triph­enyl-, salt with 3,3,4,4-tetrafluoro-4-sulfobutyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1001347-91-6

Iden­ti­fi­ca­tion Methods

HNMR, HPLC

Puri­ty

99% min, 99.5% min

Total Metal­lic Impurities

＜100ppb ; ＜50ppb

Shelf Life

1 year

Stor­age

Under room tem­per­a­ture away from light

Known Appli­ca­tion

Main Uses
1.Serves as a photoacid generator (PAG) in chemically amplified photoresists, mainly used for semiconductor lithography processes such as KrF (248 nm) and ArF (193 nm) exposure, to realize high-resolution pattern formation for integrated circuits and advanced chip manufacturing.
2.Applied in electronics imaging materials including LCD panels, printing plates, photocurable coatings and inks, providing high sensitivity and thermal stability.
3.Used as a photochemical reagent in organic synthesis and laboratory R&D, for light-triggered acid-catalyzed reactions in fine chemical preparation.

Links

This prod­uct is devel­oped by our R&D com­pa­ny Wat­sonChem Advanced Chem­i­cal Mate­ri­als (https://​www​.wat​sonchem​.com/).

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