
Identification
CAS Number
75-24-1
Name
Trimethylaluminium
Synonyms
AlMe3
Aluminum trimethanide
Aluminum, trimethyl- [ACD/Index Name]
AV210LG46J
BD2204000
MFCD00008252 [MDL number]
TMA
trimethyl aluminum
Trimethylaluminium [ACD/IUPAC Name] [Wiki]
Trimethylaluminium [German] [ACD/IUPAC Name]
Triméthylaluminium [French] [ACD/IUPAC Name]
trimethylaluminum [Wiki]
(CH3)3Al
26628-81-9 [RN]
4-04-00-04397 (Beilstein Handbook Reference) [Beilstein]
aluminium, trimethyl-
Aluminum trimethyl
EINECS 200-853-0
Trimethylalane
trimethylalumane
trimethyl-aluminum
Trimethylaluminum, 2M in toluene
Trimethylaluminum, elec. gr.
Trimethylaluminum, elec.gr.
Trimethylaluminum,2.0M in hexane
Trimethylaluminummissing
trimetilalumínio [Portuguese]
UN 1103
UNII :AV210LG46J
UNII-AV210LG46J
SMILES
C[Al](C)C
StdInChI
InChI=1S/3CH3.Al/h3*1H3 ;
StdInChIKey
JLTRXTDYQLMHGR-UHFFFAOYSA-N
Molecular Formula
C3H9Al
Molecular Weight
72.085
MDL Number
MFCD00008252
Properties
Safety Data
Symbol
Signal Word
Warning
Hazard statements
H225 – H250 – H260 – H304 – H314 – H336 – H361d – H373 – H412Precautionary Statements
P210 – P231 + P232 – P280 – P301 + P330 + P331 – P303 + P361 + P353 – P304 + P340 + P310 – P305 + P351 + P338WGK Germany
3
MSDS Download
Specifications and Other Information of Our
Identification Methods
Structure
Structure of Trimethylaluminium CAS 75-24-1
Known Application
Trimethylaluminum serves as a precursor material in the MOCVD method, used for depositing metal oxide films such as aluminum oxide. And In some organic synthesis reactions, trimethylaluminum is used as a precursor for catalysts, playing a role in catalyzing certain reactions.
Trimethylaluminum is a common precursor material used to deposit metal films, such as aluminum, aluminum alloys, or other metal oxide films, in semiconductor devices. These films play a crucial role in integrated circuits and other microelectronic devices.
General View of Documents
Links
This product is developed by our R&D company Warshel Chemical Ltd (https://www.warshel.com/).
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